D18V is SilTerra’s Bipolar-CMOS-DMOS (BCD) technology where the Low voltage of 1.8V device is compatible with the foundry 0.18um CMOS technology. The thick gate 5V device is optimized for high analog performance. It is built as the foundation for DMOS devices and has demonstrated meeting industry Rdson performance.


The D18V technology offers process options like MV with Deep-Nwell, MiM Capacitor, Power-Line Metal and various ESD devices, which enhance the power efficiency and reliability performance. The D18V technology is ideal for design of high performance analog devices such as wireless chargers, DC-DC converters, load switches and various Power Management IC applications. The D18V technology is supported by proven Foundry design kits and PDK.

180nm BCD (D18V) Key Process Features

  • Standard 1P3M process up to six metal layers
  • Supports 5V only or 1.8V / 5.0V
  • Modular and scalable DMOS device (12V to 60V)
  • Supports various BJT devices VPNP & VNPN BJT (LV/MV/HV)
  • Supports P-Zener, Schottky Barrier Diode (MV/HV)
  • High Poly Resistor supported ( 1K, 2K & 4Kohm/sq)
  • Cobalt silicided source, drain and gate
  • Shallow trench isolation
  • Aluminum metallization with tungsten plug
  • FSG inter-metal dielectric
  • Metal-Insulator-Metal (MIM) Capacitor (Option)
  • Power Line Metal (2.3/3.0/4.0um) for high current carrying
  • Model temperature range: -40°C to 175°C

Physical Design Rules

Parameter Unit 1.8V Pitch 5.0V Pitch
Active μm 0.50 0.87
Poly μm 0.43 0.70 (3.63V max) 0.85 (5.5V max)
Contact μm 0.47 0.47
Metal 1 μm 0.46 0.46
Via 1 μm 0.52 0.52
Metal X μm 0.56 0.56
Via X μm 0.52 0.52
Via Top μm 0.71 0.71
Metal Top μm 0.90 0.90

Electrical Design Rules

Parameter Unit 1.8V Thin Gate 5.0V Thick Gate
Vtn_lin V 0.439 0.791
Vtp_lin V -0.477 -0.752
Idsn μA/μm 583 515
Idsp μA/μm -251 -272
Ioff |pA/μm| <20 <20

Foundation IP

IP Name Vendor Available
Std Cell SC9 RVT ARM / Custom Now
Std Cell SC7 RVT ARM / Custom Now
Memory Compilers ARM / Custom Now
IO Library (1.8V/5V) Custom Now
OTP Ememory Now
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